发明名称 Substrate treatment apparatus
摘要 A substrate treatment apparatus is disclosed. The substrate treatment apparatus includes: a cassette loading portion on which a cassette for containing a substrate is loaded when the cassette is carried to/from outside of the substrate treatment apparatus; a substrate treatment portion for performing a treatment on the substrate; a substrate carrying portion for carrying the substrate in the cassette loaded on the cassette loading portion to the substrate treatment portion, and carrying the substrate that has been subjected to the treatment by the substrate treatment portion to the cassette on the cassette loading portion; a vacant cassette loading portion on which the cassette caused to be vacant by carrying the substrate to the substrate treatment portion is temporarily loaded; and a vacant cassette transfer mechanism for transferring the vacant cassette between the vacant cassette loading portion and the cassette loading portion.
申请公布号 US8043039(B2) 申请公布日期 2011.10.25
申请号 US20080207809 申请日期 2008.09.10
申请人 TOKYO ELECTRON LIMITED 发明人 YAMAMOTO YUICHI;TERAMOTO AKIHIRO;TSUKINOKI WATARU
分类号 H01L21/677 主分类号 H01L21/677
代理机构 代理人
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