发明名称 Process for manufacturing a power device on a semiconductor substrate and corresponding device
摘要 An electronic device includes a semiconductor substrate of a first conductivity type and a drain layer adjacent the semiconductor substrate and having a plurality of drains. The drain layer includes a first semiconductor layer of the first conductivity type adjacent the semiconductor substrate, and at least one second semiconductor layer of a second conductivity type adjacent the first semiconductor layer. Moreover, a plurality of first column regions of the first conductivity type extends through the at least one second semiconductor layer to contact the first semiconductor layer. A plurality of second column regions of the second conductivity type delimits the plurality of first column regions. Furthermore, a plurality of body regions of the second conductivity type are adjacent respective ones of the plurality of second column regions.
申请公布号 US8044462(B2) 申请公布日期 2011.10.25
申请号 US20080029935 申请日期 2008.02.12
申请人 STMICROELECTRONICS S.R.L. 发明人 MICCICHE MONICA;GRIMALDI ANTONIO GIUSEPPE;ARCURI LUIGI
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
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