| 发明名称 |
FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.</p> |
| 申请公布号 |
KR20110115537(A) |
申请公布日期 |
2011.10.21 |
| 申请号 |
KR20110034674 |
申请日期 |
2011.04.14 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
PHILIPS DANNY MARIA HUBERTUS;DIRECKS DANIEEL JOZEF MARIA;VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS;SCHEPERS MAIKEL ADRIANUS CORNELIS;BERKVENS PAUL PETRUS JOANNES;VAN DER ZANDEN MARCUS JOHANNES;MULDER PIETER |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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