摘要 |
The invention relates to a method for producing a dielectric layer on the surface of a component, by means of which a desired topography can be set. In particular, a dielectric layer having a planar surface can be generated over a substrate topography having raised structures. In a trimming process, a component property, which depends on the thickness or the third topography of the dielectric layer, is adjusted. |
申请人 |
EPCOS AG;BINNINGER, CHARLES;EGGS, CHRISTOPH;FUERBACHER, BRUNO;KNAUER, ULRICH;MAISCH, MANFRED;ZOTTL, HELMUT |
发明人 |
BINNINGER, CHARLES;EGGS, CHRISTOPH;FUERBACHER, BRUNO;KNAUER, ULRICH;MAISCH, MANFRED;ZOTTL, HELMUT |