| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film improving a gas barrier property of one silica film layer derived from polysilazane and formed on a base material, and to provide a method for manufacturing the gas barrier film reducing a manufacture cost and showing excellent working efficiency.SOLUTION: The gas barrier film 1 is a laminate comprising: the resin base material 2; the first silica film 3 formed on the resin base material 2 by emitting ultraviolet light having a wavelength of 155 to 274 nm to the polysilazane; and the second silica film 4 derived from colloidal silica and laminated on the first silica film 3. |
