| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for teaching of a substrate processing apparatus, capable of alleviating a teaching operation and achieving more accurate teaching.SOLUTION: A transparent sheet 30 is mounted to a nozzle 3. In this case, the nozzle 3 is positioned on the reference line of the transparent sheet 30. A patterned sheet 50 is attached on the upper side of a spin base 6. The spin base 6 is rotated around a vertical axial line. A concentric pattern 52 with a rotational center BC as the center thereof is displayed on the upper side 16 of the spin base 6. The nozzle 3 and the transparent sheet 30 are moved along an orbit in the upper part on the upper side 16 of the rotating spin base 6. When the striped pattern of the transparent sheet 30 is overlapped with the concentric pattern 52, a line-symmetric moire pattern is displayed. When the symmetric axis of the moire pattern included in an image taken by a camera is made coincident to the reference line, the rotation value of a stepping motor is attained. |
