发明名称 METHOD AND DEVICE FOR QUANTITATIVELY ANALYZING IMPURITIES IN RAW MATERIAL CONTAINING ORGANOMETAL COMPOUND
摘要 PROBLEM TO BE SOLVED: To provide a method and a device for detecting and quantitatively analyzing a volatile impurity component contained in a raw material containing an organometal compound with high sensitivity without scattering the volatile impurity component.SOLUTION: The method for quantitatively analyzing impurities in the raw material containing the organometal compound quantitatively analyzes a concentration of the impurities in the raw material containing the organometal compound using a gas chromatograph and contains a decomposition process for applying decomposition treatment to the raw material and decomposing the organometal compound contained in the raw material and a measuring process for measuring the impurities in the raw material subjected to decomposition treatment by a gas chromatograph. In the decomposition process, the organometal compound is decomposed into a metal and hydrocarbon gas or hydrogen gas between the sample introducing part and a separation column in the gas chromatograph.
申请公布号 JP2011208943(A) 申请公布日期 2011.10.20
申请号 JP20100073844 申请日期 2010.03.26
申请人 SUMITOMO CHEMICAL CO LTD 发明人 YOSHIKAWA TAKESHI;MURAKAMI HAJIME
分类号 G01N30/14;G01N30/88 主分类号 G01N30/14
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