| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a metal oxide film pattern free of complicated processes, which can form proper patterns even when a material quality or film thickness of the metal oxide film differs between the front and back of a substrate.SOLUTION: This method for producing metal oxide film patterns comprises: a first film-forming step of forming a film α containing a metal complex A on one surface of the substrate; a second film-forming step of forming a film β containing a metal complex B on the other surface thereof; a first exposure step of exposing the film α using light including a wavelength region λ; a second exposure step of exposing the film β using light including a wavelength λ; a first development step of developing the film α; a second development step of developing the film β; a conversion step of converting the metal complex A and the metal complex B into metal oxides, respectively. The metal complex B, when irradiated with light of the wavelength region λ, changes in resolvability to the developer larger than the case that the metal complex A is irradiated with light of the wavelength region λ. |
