| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a transparent conductive film of low resistance and high transmittance in a simple process.SOLUTION: With a thermal CVD (chemical vapor deposition) method for forming a transparent conductive film on a base body, a transparent conductive tin oxide (SnO) film (P) can be obtained in a process (S1) of evaporating a solid raw material (R) by direct heating and a process (S2) of depositing raw material gas on the heated base body. The method is enabled to form a film under an atmosphere without the need of a spray nozzle, a vacuum equipment or the like, and to manufacture a conductive tin oxide film of high quality with a simple equipment. |
