| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which does not form vapor deposition spots on individual substrates even when vapor-deposited films are formed on many substrates at a time, and can manufacture a substrate having stable reflection properties.SOLUTION: This vapor deposition apparatus is constituted by: a substrate support member 2 for supporting a plurality of substrates 6; and a vapor deposition source 4 which spreads a desired vapor-deposition material onto the surface to be vapor-deposited of the substrate 6 supported by the substrate support member 2, and is arranged so that angles from the vapor deposition source 4 with respect to the fringes of the surfaces to be vapor-deposited of each substrate 6 are approximately the same over all perimeters of the surfaces to be vapor-deposited. Because the angles from the vapor deposition source 4 with respect to the fringes of the surfaces to be vapor-deposited of each substrate 6 are approximately the same over all perimeters of the surfaces to be vapor-deposited, vapor deposition angles of the vapor deposition material spreading from the vapor deposition source 4 become same in the fringes of the surfaces to be vapor-deposited of each substrate 6. Because of this, the vapor deposition material uniformly deposits on the fringes of each substrate 6, and vapor-deposited films having a uniform film thickness are formed. |
