发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
The present invention relates to a photosensitive resin composition for an organic insulating layer. More specifically, the invention can be used for forming a substrate of a transflective thin film transistor liquid crystal display (TFT-LCD) or a pattern of an interlayer insulating layer by improving remarkably a pattern property with a high taper angle besides improvement of flatness, sensitivity, heat resistance, and transparency. Particularly, the photosensitive resin composition can provide low power dissipation besides a wide viewing angle and high visibility when being applied to a transflective type display. In addition, the photosensitive resin composition can provide a clear screen under natural light without a backlight by maintaining the brightness of a screen and prominent field visibility. |
申请公布号 |
WO2011062446(A3) |
申请公布日期 |
2011.10.20 |
申请号 |
WO2010KR08212 |
申请日期 |
2010.11.19 |
申请人 |
KOLON INDUSTRIES, INC.;YANG, PIL RYE;YOON, KYUNG KEUN;LEE, YUN JAE |
发明人 |
YANG, PIL RYE;YOON, KYUNG KEUN;LEE, YUN JAE |
分类号 |
G03F7/027;G03F7/028;G03F7/075 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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