发明名称 FOCUSED ION BEAM DEVICE, CHIP TIP STRUCTURE INSPECTION METHOD, AND CHIP TIP STRUCTURE REGENERATION METHOD
摘要 PROBLEM TO BE SOLVED: To confirm a tip structure of an emitter without introducing a system for FIM image acquisition.SOLUTION: A focused ion beam device which supplies gas to a chip 1, impresses voltage on an extraction electrode 4, and emits an ion beam 11 from the chip 1, is provided with a current measurement portion 111 varying voltage and measuring current volume of the ion beam 11, and a processing unit 114 performing comparison process between measurement data measured at the current measurement portion 111 and standard data. Thus the focused ion beam device inspects a chip tip structure.
申请公布号 JP2011210494(A) 申请公布日期 2011.10.20
申请号 JP20100076350 申请日期 2010.03.29
申请人 SII NANOTECHNOLOGY INC 发明人 OGAWA TAKASHI;NISHINAKA KENICHI;SUGIYAMA YASUHIKO
分类号 H01J37/317;H01J37/04 主分类号 H01J37/317
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