发明名称 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR FORMING CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is excellent in storage stability, sensitivity and development margin (development latitude), and gives a cured film with excellent transparency and solvent resistance.SOLUTION: The photosensitive resin composition comprises (A) a copolymer comprising a monomer unit (1) having a phenolic hydroxyl group, a monomer unit (2) having a residue in which a carboxy group is protected by an acid-decomposable group or a monomer unit (2) having a residue in which a phenolic hydroxyl group is protected by an acid-decomposable group, and a monomer unit (3) having a cyclic ether residue with a 3-membered ring and/or a 4-membered ring, (B) a photoacid generator, and (C) a solvent.
申请公布号 JP2011209680(A) 申请公布日期 2011.10.20
申请号 JP20100213349 申请日期 2010.09.24
申请人 FUJIFILM CORP 发明人 HIKITA MASANORI;YAMADA SATORU;KAWABE YASUMASA
分类号 G03F7/039;C08F220/30;G03F7/004;G03F7/40 主分类号 G03F7/039
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