发明名称 |
METHOD FOR MANUFACTURING NANO IMPRINT MOLD, METHOD FOR MANUFACTURING PATTERN-FORMED BODY, AND NANO IMPRINT MOLD |
摘要 |
PROBLEM TO BE SOLVED: To mainly obtain a nano imprint mold showing good fillability of a resin in a recess of a pattern and mold releasability.SOLUTION: The method for manufacturing the nano imprint mold has: a first mold release layer-forming process of preparing a mold member including a pattern with a protrusion and a recess and a metallic film formed on the top of the protrusion, and forming the first mold release layer on the side wall and bottom of the recess and on the surface of the metallic film using the first mold release agent; a metallic film-peeling process of peeling the metallic film having the first mold release layer on the surface; and a second mold release layer-forming process of forming the second mold release layer having higher liquid repellency than the first mold release layer on the top of the protrusion exposed by peeling the metallic film using the second mold release agent. |
申请公布号 |
JP2011206981(A) |
申请公布日期 |
2011.10.20 |
申请号 |
JP20100075611 |
申请日期 |
2010.03.29 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
YOSHIDA KOJI;YAMADA TOMOKO;ARITSUKA YUKI;NAGANUMA HIROYUKI;KURIHARA MASAAKI |
分类号 |
B29C33/58;B29C59/02;B81C1/00;H01L21/027 |
主分类号 |
B29C33/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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