发明名称 METHOD FOR MANUFACTURING NANO IMPRINT MOLD, METHOD FOR MANUFACTURING PATTERN-FORMED BODY, AND NANO IMPRINT MOLD
摘要 PROBLEM TO BE SOLVED: To mainly obtain a nano imprint mold showing good fillability of a resin in a recess of a pattern and mold releasability.SOLUTION: The method for manufacturing the nano imprint mold has: a first mold release layer-forming process of preparing a mold member including a pattern with a protrusion and a recess and a metallic film formed on the top of the protrusion, and forming the first mold release layer on the side wall and bottom of the recess and on the surface of the metallic film using the first mold release agent; a metallic film-peeling process of peeling the metallic film having the first mold release layer on the surface; and a second mold release layer-forming process of forming the second mold release layer having higher liquid repellency than the first mold release layer on the top of the protrusion exposed by peeling the metallic film using the second mold release agent.
申请公布号 JP2011206981(A) 申请公布日期 2011.10.20
申请号 JP20100075611 申请日期 2010.03.29
申请人 DAINIPPON PRINTING CO LTD 发明人 YOSHIDA KOJI;YAMADA TOMOKO;ARITSUKA YUKI;NAGANUMA HIROYUKI;KURIHARA MASAAKI
分类号 B29C33/58;B29C59/02;B81C1/00;H01L21/027 主分类号 B29C33/58
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