发明名称 FIELD EFFECT TRANSISTOR USING OXIDE FILM FOR CHANNEL AND METHOD OF MANUFACTURING THE SAME
摘要 The present invention provides a field effect transistor including an oxide film as a semiconductor layer, wherein the oxide film includes one of a source part and a drain part to which one of hydrogen and deuterium is added.
申请公布号 US2011256684(A1) 申请公布日期 2011.10.20
申请号 US201113169221 申请日期 2011.06.27
申请人 CANON KABUSHIKI KAISHA 发明人 IWASAKI TATSUYA;KUMOMI HIDEYA
分类号 H01L21/336;H01L21/265 主分类号 H01L21/336
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