发明名称 MICROFEATURE WORKPIECES HAVING CONDUCTIVE INTERCONNECT STRUCTURES FORMED BY CHEMICALLY REACTIVE PROCESSES, AND ASSOCIATED SYSTEMS AND METHODS
摘要 Microfeature workpieces having conductive vias formed by chemically reactive processes, and associated systems and methods are disclosed. A method in accordance with one embodiment includes disposing a conductive lining on walls of a via in a microfeature workpiece, so that a space is located between opposing portions of the lining facing toward each other from opposing portions of the wall. The method can further include chemically reacting the lining with a reactive material to form a chemical compound from a constituent of the reactive material and a constituent of the lining. The method can still further include at least partially filling the space with the compound. In particular embodiments, the conductive lining includes copper, the reactive material includes sulfur hexafluoride, and the chemical compound that at least partially fills the space in the via includes copper sulfide.
申请公布号 US2011256711(A1) 申请公布日期 2011.10.20
申请号 US201113169134 申请日期 2011.06.27
申请人 MICRON TECHNOLOGY, INC. 发明人 BORTHAKUR SWARNAL
分类号 H01L21/4763 主分类号 H01L21/4763
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