| 摘要 |
The present invention is a chemical composition to remove epoxy-based photoimageable coatings that include a solvent system to dissolve and rinse away the coating, an acidic additive that hydrolyzes the coating and releases a plurality of monomeric forms to the solvent, a plurality of inhibitors that protect any exposed substrate and a surfactant to lower a surface tension of the coating on the substrate. The composition can be utilized with a method for removing a partial cured and a fully cured epoxy-based photoimageable coating from a substrate with the composition to remove epoxy-based photoimageable coatings.
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