发明名称 GAS AND LIQUID INJECTION METHODS AND APPARATUS
摘要 A liquid injection system for a processing chamber includes a liquid injector that receives a liquid from a liquid supply and that selectively pulses the liquid into a conduit. A control module selects a number of pulses and a pulse width of the liquid injector. A gas supply supplies gas into the conduit. A sensor senses at least one of a first temperature and a first pressure in the conduit and that generates at least one of a first temperature signal and a first pressure signal, respectively. The control module confirms that the selected number of pulses occur based on the at least one of the first temperature signal and the first pressure signal.
申请公布号 US2011256724(A1) 申请公布日期 2011.10.20
申请号 US201113083827 申请日期 2011.04.11
申请人 NOVELLUS SYSTEMS, INC. 发明人 CHANDRASEKHARAN RAMESH;XAVIER ANTONIO;JENNINGS KEVIN;LI MING;JON HENRI;HAUSMANN DENNIS
分类号 H01L21/311;B67D7/06;B67D7/14 主分类号 H01L21/311
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