发明名称 INSPECTING DEVICE, DEFECT CLASSIFYING METHOD, AND DEFECT DETECTING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an inspecting device that detect micropipe defects formed in an SiC substrate and an epitaxial layer and a defect in a base surface with high precision, and discriminates them from other defects.SOLUTION: A confocal differential interference image of an SiC substrate surface or epitaxial layer surface is picked up using a confocal scanner including a differential interference optical system. The confocal differential interference image shows unevenness change of approximately several nm of a sample surface in the form of a luminance distribution, so a crystal defect appearing on the SiC substrate surface or epitaxial layer surface is detected based upon the luminance distribution. The luminance distribution varies in accordance with kinds of defects, so the defect is classified from points of view of the shape and luminance distribution of the defect image. In particular, the micropipe defect and in-base-plane defect can be discriminated from other defects by using the classifying method.
申请公布号 JP2011211035(A) 申请公布日期 2011.10.20
申请号 JP20100078511 申请日期 2010.03.30
申请人 LASERTEC CORP 发明人 SEKI HIROKAZU;KUSUSE HARUHIKO
分类号 H01L21/66;G01B11/00;G01B11/24;G01B11/30;G01N21/956 主分类号 H01L21/66
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