发明名称 |
POLISHING PAD AND METHOD FOR PRODUCING SAME |
摘要 |
An object of the invention is to provide a polishing pad that achieves a high polishing rate and has high thickness precision so that the break-in time (dummy polishing time) can be shortened, and to provide a method for producing same. The invention is directed to a polishing pad including a base material layer and a polishing layer provided on the base material layer, wherein the polishing layer includes a thermoset polyurethane foam having roughly spherical interconnected cells with an average cell diameter of 35 to 200 μm, and the polishing layer has a storage modulus E′ (40° C.) of 130 to 400 MPa at 40° C., a ratio of storage modulus E′ (30° C.) at 30° C. to storage modulus E′ (60° C.) at 60° C. [E′(30° C.)/E′(60° C.)] of 1 to less than 2.5, and a ratio of storage modulus E′ (30° C.) at 30° C. to storage modulus E′ (90° C.) at 90° C. [E′(30° C.)/E′(90° C.)] of 15 to 130.
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申请公布号 |
US2011256817(A1) |
申请公布日期 |
2011.10.20 |
申请号 |
US200913141298 |
申请日期 |
2009.12.24 |
申请人 |
TOYO TIRE & RUBBER CO., LTD. |
发明人 |
FUKUDA TAKESHI;ISHIZAKA NOBUYOSHI |
分类号 |
B24D11/00;B24B37/24;B24D18/00;C08G18/00;C08G101/00;H01L21/304 |
主分类号 |
B24D11/00 |
代理机构 |
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主权项 |
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地址 |
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