发明名称 LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To shorten a time used for determining a height map of a substrate.SOLUTION: A level sensor 1 configured to measure a height level of a substrate disposed in a measurement position. The level sensor 1 includes: a projection unit 3 to project a plurality of measurement beams in the plurality of measurement positions on the substrate 2; a detection unit 4 to receive the measurement beam after reflection on the substrate 2; and a processing unit 5 to calculate the height level based on the reflection measurement beam that the detection unit 4 receives, wherein the substrate 2 is disposed in the measurement position and the projection unit 3, and the detection unit 4 are disposed neighboring to the substrate 2.
申请公布号 JP2011209278(A) 申请公布日期 2011.10.20
申请号 JP20110048521 申请日期 2011.03.07
申请人 ASML NETHERLANDS BV 发明人 VAN DRENT WILLIAM PETER
分类号 G01B11/02;G03F7/20;H01L21/027 主分类号 G01B11/02
代理机构 代理人
主权项
地址