发明名称 VERTICAL JFET LIMITED SILICON CARBIDE METAL-OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTORS
摘要 Silicon carbide metal-oxide semiconductor field effect transistors (MOSFETs) may include an n-type silicon carbide drift layer, a first p-type silicon carbide region adjacent the drift layer and having a first n-type silicon carbide region therein, an oxide layer on the drift layer, and an n-type silicon carbide limiting region disposed between the drift layer and a portion of the first p-type region. The limiting region may have a carrier concentration that is greater than the carrier concentration of the drift layer.
申请公布号 US2011254016(A1) 申请公布日期 2011.10.20
申请号 US201113048696 申请日期 2011.03.15
申请人 CREE, INC. 发明人 RYU SEI-HYUNG
分类号 H01L29/772;H01L21/04;H01L29/08;H01L29/24;H01L29/78 主分类号 H01L29/772
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