| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern correction apparatus and a pattern correction method which are capable of correcting a pattern with lower power in a short cycle time.SOLUTION: The pattern correction apparatus for correcting a defective portion 24a of a pattern formed on a surface of a substrate includes: a transfer member 15 wherein at least one layer of a second metal film 27 which can be fixed to a first metal film for forming the pattern, by being melted through heating to form an alloy layer with the first material film is formed on one main surface of a base material 1; a transfer member supply means 9 for making the second metal film 27 face the defective portion 24a; a pressing means 10 for making the second metal film 27 come close contact with the defective portion 24a by pressing the transfer member 15 from the side of the other main surface opposite to the one main surface having the second metal film 27 formed on the transfer member 15, against the substrate. The pressing means 10 is provided with an ultrasonic vibrator 10a which applies ultrasonic vibrations to the transfer member 15 to heat the second metal film 27 with the second metal film 27 in close contact with the defective portion 24a. |
