发明名称 LIQUID METAL ION SOURCE, METHOD OF MANUFACTURING THE SAME, AND ION BEAM IRRADIATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a liquid metal ion source, capable of improving the stability of an emission current value for ion beams, to provide a method of manufacturing the liquid metal ion source, and to provide an ion beam irradiation device with the liquid metal ion source.SOLUTION: The liquid metal ion source 10 includes a needle electrode 11 formed by two metal wires 11a, 11b arranged in parallel with their outer peripheries contacting each other. The needle electrode 11 includes a guide flow path where the metal wires 11a, 11b have a matched positional relationship, and an emission end T. The guide flow path is formed ranging to the emission end T. The width of the guide flow path is smaller to zero toward the bottom of the guide flow path. So, when liquid metal is supplied to the guide flow path, a capillary phenomenon occurs near the bottom of the guide flow path to develop a volume flow, instead of a normal surface flow. The liquid metal continuously flows to the emission end T, and even the liquid metal poor in wettability is stably supplied to the emission end T, thus stabilizing the emission current value for the ion beams.
申请公布号 JP2011210489(A) 申请公布日期 2011.10.20
申请号 JP20100076282 申请日期 2010.03.29
申请人 ULVAC FUAI KK;WIECK ANDREAS DIRK 发明人 SAKAI DAISUKE;KAWASAKI HOSEI;WIECK ANDREAS DIRK
分类号 H01J27/26;H01J37/08 主分类号 H01J27/26
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