| 摘要 |
A substrate washing method for supplying a process liquid onto a substrate to wash the substrate includes the steps of (a) supplying a first process liquid of a first temperature onto the substrate having a resist pattern, to cover a surface of the substrate with the first process liquid, and (b) supplying a second process liquid onto the surface of the substrate covered with the first process liquid, to cover the surface of the substrate with the second process liquid of a second temperature higher than the first temperature, thereby removing the resist pattern.
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