X-RAY LITHOGRAPHY MASK COMPOSED OF NICKEL OR A NICKEL BASE ALLOY

摘要

The present invention relates to an X-ray lithography mask composed of nickel or a nickel base alloy. An X-ray lithography mask comprising a frame and a membrane clamped thereon is proposed, wherein the membrane consists of nickel or a nickel base alloy and is provided at least partly with an absorber layer. The invention furthermore relates to a method for producing the X-ray lithography mask. In this case, a nickel layer or a layer composed of a nickel base alloy is applied to a substrate. Afterwards, an absorber structure is produced on the nickel layer or the layer composed of a nickel base alloy and a frame is applied by adhesive bonding at elevated temperatures. Finally, all the components are cooled and the frame with the clamped-on membrane composed of nickel or a nickel base alloy is detached from the substrate. The X-ray lithography mask is particularly suitable as a mask for the X-ray depth lithography method.