发明名称 METHOD FOR MANUFACTURING MICRO STRUCTURE USING X-RAY EXPOSURE
摘要 Provided is a method for fabricating a microstructure. The method includes disposing an X-ray mask on photosensitive material and exposing the photosensitive material by radiating X-rays to the photosensitive material using a side exposure scheme, etching the exposed photosensitive material, forming a mold having a micro-pattern by filing the etched photosensitive material with metal, forming a mold module by combining a plurality of molds, and forming a microstructure using the mold module.
申请公布号 US2011254195(A1) 申请公布日期 2011.10.20
申请号 US200913128016 申请日期 2009.11.02
申请人 POSTECH ACADEMY- INDUSTRY FOUNDATION 发明人 LEE BONG-KEE;KIM DONG SUNG;KWON TAI-HUN
分类号 B29C33/38 主分类号 B29C33/38
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