SUBSTRATE CONVEYANCE AND SUBSTRATE CARRYING METHOD, EXPOSURE APPARATUS AND EXPOSURE METHOD, DEVICE MANUFACTURING APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate conveyance capable of preventing device degradation caused by a liquid remaining on a substrate that has been subjected to liquid-immersion exposure.SOLUTION: The substrate conveyance conveys a substrate that has been exposed to a pattern image through a projection optical system and liquid. The substrate conveyance includes a liquid detector capable of detecting the liquid remaining on the substrate. The liquid detector detects a remaining liquid by comparing the first information regarding a substrate surface, before the substrate is exposed, with the second information regarding the substrate surface after the substrate is exposed.