发明名称 METHOD FOR INSPECTING TFT ARRAY
摘要 PROBLEM TO BE SOLVED: To shorten a period of time required to acquire a signal for use in defect detection, without lowering the precision of defect detection.SOLUTION: By reducing the number of charged beams with which each pixel is irradiated, the period of time required for sampling is shortened and a sampling point is interpolated, and the detection strength is calculated from the sampling point and an interpolating point. The method has: the detecting step of detecting the signal strength of a sampling point on a panel by charged beam irradiation; the interpolating step of interpolating the signal strength at an interpolating point near the sampling point by using the signal strength at the sampling point thus detected; the extracting step of associating the sampling point and the interpolating point with a pixel of a panel and extracting a signal point for use in defect detection from among the sampling and interpolating points associated with each respective pixel; and the signal strength calculating step of calculating one signal strength for each pixel by using the signal strengths at the sampling and interpolating points extracted in the extracting step.
申请公布号 JP2011209217(A) 申请公布日期 2011.10.20
申请号 JP20100079128 申请日期 2010.03.30
申请人 SHIMADZU CORP 发明人 IMAI DAISUKE;NAGAI MASAMICHI
分类号 G01N23/225 主分类号 G01N23/225
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