发明名称 METHOD AND APPARATUS FOR LASER MACHINING RELATIVELY NARROW AND RELATIVELY WIDE STRUCTURES
摘要 <p>The method uses a common optical, system and sequentially creates structures of different sizes in a polymer substrate by means of different laser processes is described. One process uses a laser beam that is tightly focussed on the substrate surface and is used for creating fine groove structures by semi-continuous direct write type beam movement. The second process uses a second laser beam that is used to form a larger size image on the substrate surface and is used to create blind pads and contact holes in the substrate in step and drill mode. A third optional process uses the second laser beam operating in direct writing mode to remove layers of the substrate over larger continuous areas or in a mesh type pattern.</p>
申请公布号 EP2377375(A1) 申请公布日期 2011.10.19
申请号 EP20090784591 申请日期 2009.05.27
申请人 M-SOLV LIMITED 发明人 RUMSBY, PHILIP, THOMAS
分类号 H05K3/00;B23K26/40 主分类号 H05K3/00
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