发明名称 COMPOSITION FOR FORMING HIGH-DIELECTRIC FILM FOR FILM CAPACITOR
摘要 <p>The present invention provides a high dielectric film for a film capacitor obtained by molding a film forming composition for a film capacitor comprising a thermoplastic resin (A) and surface-treated high dielectric inorganic particles (B) obtained by treating the surfaces of high dielectric inorganic particles (b1) having a dielectric constant (20°C, 1 kHz) of 100 or more with a low dielectric compound (b2) having a dielectric constant (20°C, 1 kHz) of 10 or less. This high dielectric film for a film capacitor can restrain the decrease of electrical insulating property, in spite of the high dielectric inorganic particles being dispersed at a high filling rate.</p>
申请公布号 EP2378529(A1) 申请公布日期 2011.10.19
申请号 EP20090834827 申请日期 2009.12.21
申请人 DAIKIN INDUSTRIES, LTD. 发明人 YOKOTANI, KOUJI;OTA, MIHARU;TATEMICHI, MAYUKO;KOMATSU, NOBUYUKI;MUKAI, ERI;KOH, MEITEN
分类号 H01G4/20;C08J5/18;C08K9/04;C08L27/12;C08L101/00;H01B3/00;H01B17/56;H01G4/18 主分类号 H01G4/20
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