发明名称 |
COMPOSITION FOR FORMATION OF ANTI-REFLECTIVE FILM, AND PATTERN FORMATION METHOD USING THE COMPOSITION |
摘要 |
The present invention provides a composition for forming a top anti-reflection coating having a low refractive index, realizing a gradual swing curve and giving a small swing ratio. This composition comprises a solvent and an anthracene skeleton-containing polymer having a hydrophilic group. The composition forms an anti-reflection coating on a photoresist film, and can be used in a photolithographic process for forming a pattern by use of light having a wavelength of 160 to 260 nm. |
申请公布号 |
EP2233978(A4) |
申请公布日期 |
2011.10.19 |
申请号 |
EP20080863406 |
申请日期 |
2008.12.12 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
NOYA, GO;AKIYAMA, YASUSHI;TAKANO, YUSUKE |
分类号 |
G03F7/11;C08F216/06;C08F220/10;C08F226/10;G03F7/09;H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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