| 发明名称 |
SUBSTRATE TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF USING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.</p> |
| 申请公布号 |
KR20110114513(A) |
申请公布日期 |
2011.10.19 |
| 申请号 |
KR20110090373 |
申请日期 |
2011.09.06 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ZDRAVKOV ALEXANDER NIKOLOV;PATEL HRISHIKESH;LAFARRE RAYMOND WILHELMUS LOUIS;BENSCHOP JOZEF PETRUS HENRICUS;TEN KATE NICOLAAS;ROSET NIEK JACOBUS JOHANNES;KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA;VAN OPSTAL SANDER |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
