| 摘要 |
A charged particle beam device is provided, including: a charged particle beam source (30) adapted to generate a charged particle beam on an axis; an optical aberration correction device (50) and an objective lens device (60), which define a corrected beam aperture angle (±') adjusted to reduce diffraction; and a charged particle beam tilting device; wherein the optical aberration correction device (50) and the objective lens device (60) are adapted to provide the charged particle beam with a beam aperture angle smaller than the corrected beam aperture angle (±'); and wherein the charged particle beam tilting device is adapted to provide a beam tilt angle (²) which is equal or less than the corrected beam aperture angle (±'). Further, a method of operating a charged particle beam device is provided.
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