发明名称 |
Pattern film forming method and pattern film forming apparatus |
摘要 |
A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.
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申请公布号 |
US8039373(B2) |
申请公布日期 |
2011.10.18 |
申请号 |
US20070798708 |
申请日期 |
2007.05.16 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
FUJINAWA JUN;NAKADA JUNJI;SHIBATA NORIO;KATAOKA TAKASHI |
分类号 |
B41M5/00;H01L21/20;B44C1/17;C03C17/34;C03C17/42;H01L21/40;H01L51/40;H01L51/50;H01L51/56;H05B33/10 |
主分类号 |
B41M5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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