发明名称 Surface defect data display and management system and a method of displaying and managing a surface defect data
摘要 A surface defect data display and management system comprises a risk score calculation unit for calculating the magnitude of an influence a surface defect on a wafer detected by a wafer inspection system or review system has upon a reduction in the yield of a final product as a risk score of the surface defect based on a defect size of the surface defect on the wafer and a pattern concentration obtained from design data of a pattern figure nearby a location corresponding to the position of the surface defect, and a correlation graph and defect image display unit for preparing a correlation graph showing the correlation between the defect size and the risk score of each defect, displaying the prepared correlation graph on the display apparatus and displaying additionally a defect image list of one or more defects selected by using the correlation graph.
申请公布号 US8041443(B2) 申请公布日期 2011.10.18
申请号 US20090469762 申请日期 2009.05.21
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 FUNAKOSHI TOMOHIRO
分类号 G06F19/00;G01N21/00;G06F11/30;G06K9/00;G21C17/00;H01L21/66 主分类号 G06F19/00
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