发明名称 |
Surface defect data display and management system and a method of displaying and managing a surface defect data |
摘要 |
A surface defect data display and management system comprises a risk score calculation unit for calculating the magnitude of an influence a surface defect on a wafer detected by a wafer inspection system or review system has upon a reduction in the yield of a final product as a risk score of the surface defect based on a defect size of the surface defect on the wafer and a pattern concentration obtained from design data of a pattern figure nearby a location corresponding to the position of the surface defect, and a correlation graph and defect image display unit for preparing a correlation graph showing the correlation between the defect size and the risk score of each defect, displaying the prepared correlation graph on the display apparatus and displaying additionally a defect image list of one or more defects selected by using the correlation graph.
|
申请公布号 |
US8041443(B2) |
申请公布日期 |
2011.10.18 |
申请号 |
US20090469762 |
申请日期 |
2009.05.21 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
FUNAKOSHI TOMOHIRO |
分类号 |
G06F19/00;G01N21/00;G06F11/30;G06K9/00;G21C17/00;H01L21/66 |
主分类号 |
G06F19/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|