| 摘要 |
An illumination system of a microlithographic projection exposure apparatus, as well as related systems, methods and components are disclosed. The illumination system can include a polarization manipulator configured to variably adjust a change in the polarization state of light impinging thereon. The illumination system can also include a mirror arrangement having a plurality of mirror elements that are displaceable independently of each other to alter an angle distribution of the light reflected by the mirror arrangement. A change in the intensity distribution caused by the polarization manipulator in a plane of the projection exposure apparatus can be at least partially compensated by the mirror arrangement.
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