| 摘要 |
#CMT# #/CMT# A transparent substrate, notably of glass, is provided with a stack of thin films acting on solar radiation deposited by magnetron pulverization. It comprises a lubricating film with an elevated n optical index associated with a sub-layer with a base of silicon (Si) nitride or oxynitride or carbonitride or a base of aluminum (Al) and/or zirconium (Zr) nitride or oxynitride or carbonitride or a mixture of two of these compounds (mixed Si-AL or Si-ZR nitrides or oxynitrides or carbonitrides). #CMT# : #/CMT# Independent claims are also included for : (1) monolithic or doubling glazing incorporating the transparent substrate provided with a stack of thin films; (2) a substrate that is at least partially opaque due to a coating of lacquer or enamel; and (3) a decorative facade panel incorporating the opaque panel. #CMT#USE : #/CMT# The substrate provided with a stack of thin films acting on solar radiation is used for glazing, notably destined for thermal insulation and/or solar protection or in the opaque state for decorative facade panels which in association with windows offers the entirely glass facades for the external surfaces of buildings. #CMT#ADVANTAGE : #/CMT# The invention provides a new type of stack of thin films acting on solar radiation which provides glazing with improved solar protection. The improved design is notably the establishment of a compromise between durability, thermal properties, optical properties and aptitude to support heat treatments, such as cambering, tempering and enamelling, without damage. The stack of thin films is also rendered compatible with the utilization of the glazing for buildings. #CMT#CERAMICS AND GLASS : #/CMT# The lubricating layer may have a metal base partially or entirely oxidized, the metal being either titanium or zirconium or may be a transparent dielectric material, notably chosen from silicon and/or aluminum nitride or oxynitride or silicon oxide. The stack may also include a plurality of sub-layers between the substrate and the functional layer, notably an alternance of layers with strong and weak indices such as Si N4/SiO 2 or Si 3N 4/SiO 2/Si 3N 4. |
