TRANSPARENT ELECTRODE FILM

摘要

PROBLEM TO BE SOLVED: To provide a transparent electrode film having excellent etching characteristics while maintaining a favorable transmittance for visible light and a certain degree of electric resistance, and to provide a target to be used in a sputtering process for forming the above transparent electrode film, the target capable of reducing formation of nodules or abnormal discharge and having such a composition that contamination from a pulverization medium (zirconia) can be ignored in a pulverization process for supplying a powder with high sintering property in the production of the target.SOLUTION: The transparent electrode comprises indium oxide, and the indium oxide contains over 5 to 10 wt.% of zirconium oxide.