| 摘要 |
A defect inspection device and an inspection method which can decide the quality of a pattern shape of a sample surface in a short time are provided. A defect inspection device 20 that inspects a defect of a substrate (wafer 10) on which a repeated pattern is formed includes an illumination optical system 21 that has an objective lens 9 and radiates light from a light source 1 onto the repeated pattern formed on the wafer 10 via the objective lens 9, a detection optical system 22 that detects an image of a pupil plane of the objective lens 9 produced by diffracted light of a plurality of orders caused by the repeated pattern and a detection section 23 that detects a defect of the repeated pattern of the wafer 10 from the pupil image obtained.
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