| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a photospacer having superior alkali developability, exposure sensitivity and resolution, a cured product thereof exhibiting superior adhesion to a substrate and superior elastic recovery characteristics even when a low temperature treatment is adopted.SOLUTION: The photosensitive resin composition is an alkali-developable negative photosensitive resin composition (Q) for a photospacer comprising a polyfunctional (meth)acrylate monomer (A) containing various acid groups or salts thereof, a siloxane compound (B) having two or more hydrolyzable alkoxy groups, and a photoradical polymerization initiator (C), wherein an acid value of the photosensitive resin composition based on the total weight of the components (A) to (C) is 10-110 KOHmg/g, and a content of carbon-carbon double bonds (C=C) in (meth)acryloyl groups in the photosensitive resin composition based on the total weight of the components (A) to (C) is 6.5-10.0 mmol/g. |
