| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of performing cleaning treatment uniformly on the whole area of a substrate.SOLUTION: The substrate treatment apparatus 1 includes a cleaning tank 10 for storing a cleaning liquid, and a substrate holding device 20 that holds a substrate W and immerses it in the cleaning liquid. The substrate holding device 20 has a first substrate holding section 20a and a second substrate holding section 20b that are capable of moving independently. The first substrate holding section 20a and the second substrate holding section 20b have first holding rods 21a and 21b and second holding rods 22a and 22b, which are provided on the opposite side to the first holding rods 21a and 21b with respect to a vertical direction axis passing through the center of the substrate W, respectively. |
