发明名称 LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, ILLUMINATING METHOD, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING OPTICAL APPARATUS
摘要 Disclosed is an optical apparatus, which can suppress light quantity loss due to, for instance, an overlap error of illuminating fields, and which can illuminate a surface to be illuminated under required illuminating conditions at a high light efficiency. The optical apparatus, which illuminates, with light emitted from a light source, a first region having a longer length in the second direction that intersects the first direction than the length in the first direction, is provided with: a collector optical member, which is disposed in an optical path between the light source and the first region, collects the light emitted from the light source, and forms a second region on the predetermined surface, said second region having a longer length in the fourth direction that intersects the third direction than the length in the third direction; and a first fly's eye optical member, which is provided within a predetermined surface that includes the second region, and which has a plurality of first optical elements that guide, to the first region, light transmitted from the collector optical member.
申请公布号 WO2011125827(A1) 申请公布日期 2011.10.13
申请号 WO2011JP58189 申请日期 2011.03.31
申请人 NIKON CORPORATION;KOMATSUDA HIDEKI;KAWABE YOSHIO 发明人 KOMATSUDA HIDEKI;KAWABE YOSHIO
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址