| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a photomask which produces an electronic circuit board and also performs inspection of a mask defect inspection device itself, and also to provide a method for inspecting a photomask defect inspection device, by using the photomask, and a device for inspecting a photomask defect inspection device.SOLUTION: The method for manufacturing a photomask has: a creation step of creating mask pattern data which exhibits a mask pattern in which a defect inspection pattern for inspecting a photomask defect inspection device is arranged, avoiding an electronic circuit area on the electronic circuit board, wherein the photomask defect inspection device inspects defects of a photomask used when producing the electronic circuit board; and a transfer step of transferring the mask pattern, which the mask pattern data created in the creation step exhibits, to the photomask. |
