发明名称 METHODS OF MAKING SUBSTRATE STRUCTURES HAVING A WEAKENED INTERMEDIATE LAYER
摘要 This invention provides composite semiconductor substrates and methods for fabricating such substrates. The composite structures include a semiconductor substrate, a semiconductor superstrate and an intermediate layer interposed between the substrate and the superstrate that comprises a material that undergoes a structural transformation When subject to a suitable heat treatment. The methods provide such a heat treatment so that the intermediate layer becomes spongy or porous, being filled with numerous micro-bubbles or micro-cavities containing a gaseous phase. The composite semiconductor substrates with structurally-transformed intermediate layers have numerous applications.
申请公布号 US2011250416(A1) 申请公布日期 2011.10.13
申请号 US201113162230 申请日期 2011.06.16
申请人 发明人 BRUEL MICHEL;ASPAR BERNARD;LAGAHE-BLANCHARD CHRYSTELLE
分类号 B32B7/02;B32B3/26;H01L21/762 主分类号 B32B7/02
代理机构 代理人
主权项
地址