发明名称 |
PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME |
摘要 |
New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided. |
申请公布号 |
US2011250538(A1) |
申请公布日期 |
2011.10.13 |
申请号 |
US20100965368 |
申请日期 |
2010.12.10 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
LI MINGQI;AQAD EMAD;LIU CONG;MATTIA JOSEPH;XU CHENG-BAI;BARCLAY GEORGE G. |
分类号 |
G03F7/004;C07D333/46;C07D493/18;C07J9/00;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|