DIELECTRIC WINDOW FOR PLASMA PROCESSING DEVICE, PLASMA PROCESSING DEVICE, AND METHOD FOR ATTACHING DIELECTRIC WINDOW FOR PLASMA PROCESSING DEVICE

摘要

In a dielectric window (41) for a plasma processing device, a first dielectric window concave section (47) is provided in a region on the radially outward side of a surface on a side which generates plasma, and is concaved in a tapered shaped toward the inner side in the plate thickness direction of the dielectric window (41). In a region on the radially inward side of the first dielectric window concave section (47), a plurality of second dielectric window concave sections (53a-53g), which are concave from the surface on the side which generates plasma, toward the inner side in the plate thickness direction of the dielectric window (41), are provided. The plurality of second dielectric window concave sections (53a-53g) are arranged at intervals from one another in the circumferential direction so as to have rotational symmetry centred on the centre (56) of the dielectric window (41) in the radial direction.