| 摘要 |
PROBLEM TO BE SOLVED: To provide a method capable of accurately monitoring a progress of polishing and detecting an exact end point of polishing.SOLUTION: In this method, light is cast on a substrate during polishing of the substrate, and reflection light from the substrate is received and the intensity of the reflection light is measured for each wavelength. Then, a spectrum indicating the relation between the intensity and the wavelength is generated from the measured intensities of the reflection light. An amount of change in spectrum per predetermined period of time is calculated. Amounts of change in spectrum are accumulated over the polishing time to calculate an accumulated amount of change in spectrum. Based on the accumulated amount of change in spectrum, a progress of substrate polishing is monitored. |
