PLASMA IGNITER FOR INDUCTIVELY COUPLED PLASMA ION SOURCE

摘要

PROBLEM TO BE SOLVED: To provide a method for igniting plasma in a focused ion beam system in which the inductively coupled plasma ion source is biased to a high dc voltage.SOLUTION: In the focused ion beam system, a high dc voltage of a biasing power supply 930 connects to an oscillatory waveform from a plasma igniter 950 near a focused ion beam column and applies to a source biasing electrode 906 comprising a part of a plasma chamber 954. A logic circuitry 924 controls a plasma igniter power supply 925 which drives the plasma igniter 950. An oscillatory waveform from the plasma igniter 950 whose potential is lower is connected to the high dc voltage through an insulation transformer or a capacitor. By mounting the plasma igniter 950 near the focused ion beam column, capacitance effects of the cable supplying the high dc voltage are minimized.