发明名称 COMPOSITION FOR FORMING HIGH DIELECTRIC FILM FOR FILM CAPACITOR
摘要 The present invention provides a high dielectric film for a film capacitor obtained by molding a film forming composition for a film capacitor comprising a thermoplastic resin (A) and surface-treated high dielectric inorganic particles (B) obtained by treating the surfaces of high dielectric inorganic particles (b1) having a dielectric constant (20° C., 1 kHz) of 100 or more with a low dielectric compound (b2) having a dielectric constant (20° C., 1 kHz) of 10 or less. This high dielectric film for a film capacitor can restrain the decrease of electrical insulating property, in spite of the high dielectric inorganic particles being dispersed at a high filling rate.
申请公布号 US2011249374(A1) 申请公布日期 2011.10.13
申请号 US200913141274 申请日期 2009.12.21
申请人 DAIKIN INDUSTRIES, LTD. 发明人 YOKOTANI KOUJI;OTA MIHARU;TATEMICHI MAYUKO;KOMATSU NOBUYUKI;MUKAI ERI;KOH MEITEN
分类号 H01G4/08;B32B15/04;C08K5/101;C08K5/521;C08K5/524;C08K5/5415;C08L27/16 主分类号 H01G4/08
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