发明名称 |
COMPOSITION FOR FORMING HIGH DIELECTRIC FILM FOR FILM CAPACITOR |
摘要 |
The present invention provides a high dielectric film for a film capacitor obtained by molding a film forming composition for a film capacitor comprising a thermoplastic resin (A) and surface-treated high dielectric inorganic particles (B) obtained by treating the surfaces of high dielectric inorganic particles (b1) having a dielectric constant (20° C., 1 kHz) of 100 or more with a low dielectric compound (b2) having a dielectric constant (20° C., 1 kHz) of 10 or less. This high dielectric film for a film capacitor can restrain the decrease of electrical insulating property, in spite of the high dielectric inorganic particles being dispersed at a high filling rate.
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申请公布号 |
US2011249374(A1) |
申请公布日期 |
2011.10.13 |
申请号 |
US200913141274 |
申请日期 |
2009.12.21 |
申请人 |
DAIKIN INDUSTRIES, LTD. |
发明人 |
YOKOTANI KOUJI;OTA MIHARU;TATEMICHI MAYUKO;KOMATSU NOBUYUKI;MUKAI ERI;KOH MEITEN |
分类号 |
H01G4/08;B32B15/04;C08K5/101;C08K5/521;C08K5/524;C08K5/5415;C08L27/16 |
主分类号 |
H01G4/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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